Japanese company Fujifilm plans to establish a greenfield semiconductor materials manufacturing facility in India with a total investment of approximately ₹800 crore (USD 83 million).
The investment will be made in two phases starting from October 2026, with commercial production at the facility expected to begin in fiscal year 2028, the company said.
The first phase will focus on manufacturing materials for front-end semiconductor processes. The second phase will cover semiconductor surface conditioning materials and high-purity chemicals, with investment planned according to the development of the semiconductor industry and customer demand.
Fujifilm said it will work in line with the vision of the India Semiconductor Mission and plans to utilise support available under the ISM 2.0 policy, approved by the Government of India in July 2026.